NGI3000

Our robust, popular ion source is designed for the cleaning of surfaces by ion sputtering with beam energies up to 3 keV and typical ion currents up to 30 µA. The gun employs a novel gas injection system which allows sputtering to take place at a typical chamber pressure of 1 x 10^-6 Torr.

• patented gas injection system avoids expensive differential pumping equipment
• noble gas sputtering at low chamber pressures
• broad ion beam ensures uniform sputtering
• compatible with general sputter cleaning and ISS applications
• continuously tunable beam voltage from 200 V to 3 kV
• digital control electronics with USB or Ethernet interface